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Volumn 21, Issue 7, 2000, Pages 356-358

High-voltage lateral RESURF MOSFET's on 4H-SiC

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; ANNEALING; ELECTRIC CONTACTS; ELECTRIC RESISTANCE MEASUREMENT; ELECTRON MOBILITY; INTEGRATED CIRCUIT MANUFACTURE; LOW TEMPERATURE OPERATIONS; NITROGEN; PHOSPHORUS; SEMICONDUCTOR DEVICE STRUCTURES; SILICON CARBIDE; VOLTAGE MEASUREMENT;

EID: 0034217270     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.847379     Document Type: Article
Times cited : (37)

References (16)
  • 1
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    • Agarwal, A.K.1
  • 2
    • 0031357365 scopus 로고    scopus 로고
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    • P. M. Shenoy and B. J. Baliga, "The planar 6H-SiC ACCUFET: A new high-voltage power MOSFET structure," IEEE Electron Device Lett., vol. 18, pp. 589-591, 1997.
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    • Shenoy, P.M.1    Baliga, B.J.2
  • 5
    • 0031701672 scopus 로고    scopus 로고
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    • A. K. Agarwal et al., "1400V 4H-SiC power MOSFET's," Mat. Sci. Forum, vol. 264-268, pp. 989-992, 1998.
    • (1998) Mat. Sci. Forum , vol.264-268 , pp. 989-992
    • Agarwal, A.K.1
  • 6
    • 0033097236 scopus 로고    scopus 로고
    • An 1800 V triple implanted vertical SiC MOSFET
    • D. Peters et al., "An 1800 V triple implanted vertical SiC MOSFET." IEEE Trans. Electron Devices, vol. 46, pp. 542-545, 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , pp. 542-545
    • Peters, D.1
  • 9
    • 0343830021 scopus 로고    scopus 로고
    • High-voltage lateral RESURF MOSFET's in 4H-SiC
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    • (1999) Device Research Conference
    • Chatty, K.1
  • 10
    • 0342524745 scopus 로고    scopus 로고
    • Investigation of lateral RESURF, 6H-SiC MOSFETs
    • A. K. Agarwal et al., "Investigation of lateral RESURF, 6H-SiC MOSFETs," in Proc. ICSCRM, 1999.
    • (1999) Proc. ICSCRM
    • Agarwal, A.K.1
  • 11
    • 0342524744 scopus 로고    scopus 로고
    • High-voltage lateral RESURF MOSFET's on 4H-SiC using nitrogen or phosphorus as implants
    • K. Chatty, S. Banerjee, T. P. Chow, and R. J. Gutmann, "High-voltage lateral RESURF MOSFET's on 4H-SiC using nitrogen or phosphorus as implants," in Proc. ICSCRM, 1999.
    • (1999) Proc. ICSCRM
    • Chatty, K.1    Banerjee, S.2    Chow, T.P.3    Gutmann, R.J.4
  • 12
    • 0018714042 scopus 로고
    • High-voltage thin layer devices (RESURF devices)
    • J. A. Appels and H. M. J. Vaes. "High-voltage thin layer devices (RESURF devices)," in IEDM Tech. Dig., 1979, pp. 238-241.
    • (1979) IEDM Tech. Dig. , pp. 238-241
    • Appels, J.A.1    Vaes, H.M.J.2
  • 13
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    • (1998) IEEE Electron Device Lett. , vol.19 , pp. 228-230
    • Sridevan, S.1    Baliga, B.J.2
  • 14
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    • Bias-temperature-stress induced mobility improvement in 4H-SiC MOSFETs
    • Spring
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  • 15
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  • 16
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    • Characterization of phosphorus implantation in 4H-SiC
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    • Khemka, V.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.