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Volumn 20, Issue 8, 1999, Pages 431-433

475-V high-voltage 6H-SiC lateral MOSFET

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER MOBILITY; ELECTRIC RESISTANCE; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DOPING; SILICON CARBIDE; SILICON WAFERS;

EID: 0032635626     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/55.778167     Document Type: Article
Times cited : (26)

References (16)
  • 1
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    • Power semiconductor device figure of merit for high-frequency applications
    • B. J. Baliga, "Power semiconductor device figure of merit for high-frequency applications," IEEE Electron Device Lett., vol. 10, p. 455, 1989.
    • (1989) IEEE Electron Device Lett. , vol.10 , pp. 455
    • Baliga, B.J.1
  • 7
    • 0031357365 scopus 로고    scopus 로고
    • The planar 6H-SiC ACCUFET: A new high-voltage power MOSFET structure
    • Dec.
    • P. M. Shenoy and B. J. Baliga, "The planar 6H-SiC ACCUFET: A new high-voltage power MOSFET structure," IEEE Electron Device Lett., vol. 18, p. 589, Dec. 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 589
    • Shenoy, P.M.1    Baliga, B.J.2
  • 9
    • 0030270893 scopus 로고    scopus 로고
    • Trends in power semiconductor devices
    • B. J. Baliga, "Trends in power semiconductor devices," IEEE Trans. Electron Devices, vol. 43, p. 1717, 1996.
    • (1996) IEEE Trans. Electron Devices , vol.43 , pp. 1717
    • Baliga, B.J.1
  • 10
    • 0018714042 scopus 로고
    • High-voltage thin layer devices (RESURF devices)
    • J. A. Appels and H. M. J. Vaes, "High-voltage thin layer devices (RESURF devices)," in IEDM Tech. Dig., 1979, p. 238.
    • (1979) IEDM Tech. Dig. , pp. 238
    • Appels, J.A.1    Vaes, H.M.J.2
  • 11
    • 0344353303 scopus 로고    scopus 로고
    • Wafers were purchased from CREE Research, Durham, NC
    • Wafers were purchased from CREE Research, Durham, NC.
  • 12
    • 0031514277 scopus 로고    scopus 로고
    • Step-controlled epitaxial growth of high-quality SiC layers
    • T. Kimoto, A. Itoh, and H. Matsunami, "Step-controlled epitaxial growth of high-quality SiC layers," Phys. Stat. Sol. B, vol. 202, no. 1, p. 247, 1997.
    • (1997) Phys. Stat. Sol. B , vol.202 , Issue.1 , pp. 247
    • Kimoto, T.1    Itoh, A.2    Matsunami, H.3
  • 13
    • 11644260117 scopus 로고    scopus 로고
    • Low interface state density oxides on P-type SiC
    • L. A. Lipkin, D. B. Slater, Jr., and J. W. Palmour, "Low interface state density oxides on P-type SiC," Mater. Sci. Forum, vol. 264-268, p. 853, 1998.
    • (1998) Mater. Sci. Forum , vol.264-268 , pp. 853
    • Lipkin, L.A.1    Slater D.B., Jr.2    Palmour, J.W.3
  • 14
    • 0014805372 scopus 로고
    • A quasi-static technique for MOS C-V and surface state measurements
    • M. Kuhn, "A quasi-static technique for MOS C-V and surface state measurements," Solid State Electron., vol. 13, p. 873, 1970.
    • (1970) Solid State Electron. , vol.13 , pp. 873
    • Kuhn, M.1
  • 15
    • 0019057709 scopus 로고
    • Experimental derivation of the source and drain resistance of MOS transistors
    • Sept.
    • P. I. Suciu and R. L. Johnston, "Experimental derivation of the source and drain resistance of MOS transistors," IEEE Trans. Electron Devices, vol. ED-27, p. 1846, Sept. 1980.
    • (1980) IEEE Trans. Electron Devices , vol.ED-27 , pp. 1846
    • Suciu, P.I.1    Johnston, R.L.2
  • 16
    • 0345215953 scopus 로고    scopus 로고
    • ATLAS was purchased from Silvaco International Corp.
    • ATLAS was purchased from Silvaco International Corp.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.