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Volumn 70, Issue 6, 2000, Pages 669-672

Universal threshold for the steam laser cleaning of submicron spherical particles from silicon

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COLLOIDS; DEPOSITION; HELIUM NEON LASERS; LASER APPLICATIONS; NEODYMIUM LASERS; PARTICLES (PARTICULATE MATTER); POLYMERS; SILICA; SILICON;

EID: 0034206767     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (65)

References (31)
  • 3
    • 0011768216 scopus 로고
    • ed. by K.L. Mittal (Plenum, New York)
    • J. Bardina: In Particles on surfaces, ed. by K.L. Mittal (Plenum, New York 1988) p. 329
    • (1988) Particles on Surfaces , pp. 329
    • Bardina, J.1
  • 16
    • 0342705998 scopus 로고    scopus 로고
    • note
    • 2 800 nm, 500 nm, PS 800 nm: Bangs Laboratories Inc., Fishers, Illinois, USA; PS 500 nm, PS 235 nm: Agar; PS 60 nm: Seradyn, Indianapolis, Indiana, USA
  • 18
    • 0343140370 scopus 로고    scopus 로고
    • Buehler Micropolish, Buehler LTD., Evanston, Illinois, USA
    • Buehler Micropolish, Buehler LTD., Evanston, Illinois, USA
  • 19
    • 84975633474 scopus 로고
    • J.M. Liu: Opt. Lett. 7(5), 196 (1982)
    • (1982) Opt. Lett. , vol.7 , Issue.5 , pp. 196
    • Liu, J.M.1
  • 22
    • 0343576122 scopus 로고    scopus 로고
    • note
    • 2 for steam laser cleaning with 8 ns pulses FWHM, λ = 532 nm, due to an erroneous calibration.
  • 30
    • 0342270852 scopus 로고    scopus 로고
    • note
    • It should be pointed out that the light intensity underneath the particles will be locally increased due to focusing effects. Studies of this phenomenon are in progress


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.