Liquid explosive evaporative removal of submicron particles from hydrophilic oxidized silicon surfaces

Journal of Adhesion

Volumn 61, Issue 1-4, 1997, Pages 293-307

  Boughaba, S ^a   Wu, X ^a   Sacher, E ^a   Meunier, M ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

Adhesion; Contamination; Hydrophilic silicon surface; Laser cleaning; Liquid explosive evaporation; Particle removal

Indexed keywords

ALUMINA; CARBON DIOXIDE LASERS; EVAPORATION; IMPURITIES; LASER APPLICATIONS; LASER BEAM EFFECTS; LASER PULSES; OXIDATION; POLYSTYRENES; SILICA; SILICON; WATER;

LIQUID EXPLOSIVES; SUBSTRATE DAMAGE; ZETA POTENTIAL;

SURFACE CLEANING;

EID: 0030642943     PISSN: 00218464     EISSN: None     Source Type: Journal    
DOI: 10.1080/00218469708010527     Document Type: Article

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