Development of low temperature ultrahigh vacuum atomic force microscope/scanning tunneling microscope

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 6 B, 2000, Pages 3750-3752

  Suzuki, Katsuyuki ^a   Iwatsuki, Masashi ^a   Kitamura, Shin Ichi ^a   Mooney, Charles B ^b  

^a JEOL LTD   (Japan)

^b JEOL USA INC   (United States)

Author keywords

AFM; Low temperature AFM; Noncontact; Si(100); STM

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; DIMERS; SCANNING TUNNELING MICROSCOPY; SILICON WAFERS; SURFACE STRUCTURE; THERMAL EFFECTS; VACUUM TECHNOLOGY;

ATOM RESOLVED NON-CONTACT ATOMIC FORCE MICROSCOPY;

MICROSCOPES;

EID: 0034205927     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.3750     Document Type: Article

References (9)

1. F. J. Giessible: Science 267 (1995) 68.
2. S. Kitamura and M. Iwatsuki: Jpn. J. Appl. Phys. 34 (1995) L145.
3. H. Ueyama, M. Ohta, Y. Sugawara and S. Morita: Jpn. J. Appl. Phys. 34 (1995) L1086.
4. K. Fukui, H. Ohnishi and Y. Iwasawa: Phys. Rev. Lett. 79 (1997) 4202.
5. S. Kitamura and M. Iwatsuki: Appl. Phys. Lett. 72 (1998) 3154.
6. W. Allers, A. Schwarz, U. D. Schwarz and R. Wiesendanger: Rev. Sci. Instrum. 69 (1998) 221.
7. Hans J. Hug, B. Stiefel, P. J. A. van Schendel, A. Moser, S. Martin and H.-J. Gütherodt: Rev. Sci. Instrum. 70 (1999) 3625.
8. H. Tokumoto and M. Iwatsuki: Jpn. J. Appl. Phys. 32 (1993) 1368.
9. H. Shigekawa, K. Miyake, M. Ishida, K. Hata, H. Oigawa, Y. Nannichi, R. Yoshizaki, A. Kawazu, T. Abe, T. Ozawa and T. Nagamura: Jpn. J. Appl. Phys. 35 (1996) L1081.