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Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4695-4703

Propagating wave characteristics for plasma production in plasma processing field

Author keywords

Diagnostics; Electron cyclotron wave; Helicon wave; Plasma processing; Plasma production; Propagating wave; Surface wave; Wave character

Indexed keywords

PLASMA DIAGNOSTICS; PLASMA HEATING; PLASMA WAVES; POLARIZATION; SURFACE WAVES; WAVE PROPAGATION;

EID: 0031176421     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4695     Document Type: Article
Times cited : (39)

References (115)
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  • 3
    • 0004278048 scopus 로고
    • American Institute of Physics, New York
    • T. H. Stix: Waves in Plasmas (American Institute of Physics, New York, 1992).
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    • Stix, T.H.1
  • 4
    • 0004267083 scopus 로고
    • Academic Press, Inc., San Diego
    • D. G. Swanson: Plasma Waves (Academic Press, Inc., San Diego, 1989).
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    • Swanson, D.G.1
  • 13
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    • See for example, M. Ono: Phys. Fluids B 5 (1993) 241.
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    • Ono, M.1
  • 14
    • 0004269031 scopus 로고
    • ed. M. A. Leontvich Consultant Bureau, New York
    • V. D. Shafranov: Reviews of Plasma Physics, ed. M. A. Leontvich (Consultant Bureau, New York, 1965) Vol. 3.
    • (1965) Reviews of Plasma Physics , vol.3
    • Shafranov, V.D.1
  • 35
    • 4243180272 scopus 로고
    • Proc. Int. Conf. on Plasma Phys
    • (Foz Do Iguaçu, 1994) and references therein
    • Y. Kawai, Y. Ueda, M. Tanaka and S. Shinohara: Proc. Int. Conf. on Plasma Phys. (Foz Do Iguaçu, 1994) AIP Conf. Proc. 345 (1995) 479, and references therein.
    • (1995) AIP Conf. Proc. , vol.345 , pp. 479
    • Kawai, Y.1    Ueda, Y.2    Tanaka, M.3    Shinohara, S.4
  • 74
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    • and references therein
    • F. F. Chen: Phys. Plasmas 3 (1996) 1783, and references therein.
    • (1996) Phys. Plasmas , vol.3 , pp. 1783
    • Chen, F.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.