Patterning of 0.175 μm platinum features using Ar/O2 chemically assisted ion-beam etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 2, 2000, Pages 765-773

  Gutsche, Martin U ^a   Athavale, Satish D ^b   Williams, Kurt ^c   Hines, Danielle ^c  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b IBM MICROELECTRONICS   (United States)

^c VEECO INSTRUMENTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION BEAMS; MULTILAYERS; TITANIUM NITRIDE;

ION BEAM ETCHING; NONVOLATILE MATERIALS;

PLATINUM;

EID: 0034156151     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591274     Document Type: Article

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