Growth characteristics and deposition mechanism of SrTiO3 thin films by plasma enhanced metalorganic chemical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 2, 2000, Pages 361-366

  Kim, D O ^a   Choi, R J ^a   Nahm, K S ^a   Hahn, Y B ^a  

^a Chonbuk National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

DIELECTRIC MATERIALS; FILM GROWTH; IRIDIUM; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXYGEN; PLASMA APPLICATIONS; PLATINUM; SILICON; SUBSTRATES; TEMPERATURE; THIN FILMS; TITANIUM;

BUBBLER TEMPERATURE; DEPOSITION RATES; PLASMA ENHANCED METALORGANIC CHEMICAL VAPOR DEPOSITION; RF SOURCE POWER; SUBSTRATE TEMPERATURE;

STRONTIUM COMPOUNDS;

EID: 0034155939     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582193     Document Type: Article

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