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Volumn 35, Issue 9 SUPPL. B, 1996, Pages 4875-4879

Preparation of SrTiO3 films on 8-inch wafers by chemical vapor deposition

Author keywords

CVD; Deposition rate; Ferroelectric thin film; Sr(DPM)2; SrTiO3; Step coverage; Transport efficiency; Uniformity

Indexed keywords

DEPOSITION RATE; FERROELECTRIC THIN FILM; TRANSPORT EFFICIENCY;

CHEMICAL VAPOR DEPOSITION; EFFICIENCY; EXPERIMENTS; FERROELECTRIC MATERIALS; STRONTIUM; THIN FILMS;

METALLIC FILMS;

EID: 0030231738 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.4875 Document Type: Article

Times cited : (7)

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