Ion bombardment and disorder in amorphous silicon

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 597-602

  Sidhu, L S ^a   Gaspari, F ^a   Zukotynski, S ^a  

^a UNIVERSITY OF TORONTO   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GLOW DISCHARGES; HYDROGEN; ION BOMBARDMENT; OPTICAL PROPERTIES; PLASMAS; RAMAN SPECTROSCOPY; SILANES; STRUCTURE (COMPOSITION); SUBSTRATES;

AMORPHOUS SILICON FILM; OPTICAL GAP;

AMORPHOUS FILMS;

EID: 0031351728     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-597     Document Type: Conference Paper

References (8)