Ion bombardment in silane VHF deposition plasmas

Materials Research Society Symposium - Proceedings

Volumn 467, Issue , 1997, Pages 603-608

  Hamers, E A G ^a   Bezemer, J ^a   Meiling, H ^a   Van Sark, W G J H ^a   Van Der Weg, W F ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; ATOMS; CHEMICAL VAPOR DEPOSITION; GLOW DISCHARGES; ION BOMBARDMENT; MASS SPECTROMETRY; PHASE TRANSITIONS; PLASMAS; SILANES; SUBSTRATES;

HYDROGENATED AMORPHOUS SILICON; ION FLUX; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

AMORPHOUS FILMS;

EID: 0031381823     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-467-603     Document Type: Conference Paper

References (9)