Reactive ion etching of Pt thin films for fabrication of microcapacitor

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Kim, Kwon Seok ^a   Lee, Jong Myeong ^a   Shin, Ju Cheol ^a   Lee, Jeon Kook ^b   Kim, Hyeong Joon ^a  

^a Seoul National University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001020113     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (5)

1. Cutis E. Farrel and K. R. Milkove, Integrated Ferroelectrics 16, 109 (1997).
2. S. Yokoyama, Y. Ito, K. Ishihara, K. Hamada, S. Ohnishi, J. Kudo and K. Sakiyama, Jpn. J. Appl. Phys. 34, 767 (1995).
3. Won Jong Yoo, Jin Hwan Hahm, Hyoun Woo Kim, Chan Ouk Jung, Young Bum Koh and Moon Yong Lee, Jpn. J. Appl. Phys. 35, 2501 (1996).
4. K. Nishikawa, Y. Kusumi, T. Oomori, M. Hanazaki and K. Namba, Jpn. J. Appl. Phys. 32, 6102 (1993).
5. Dennis M. Manos and Daniel L. Flamm, Plasma Etching (Academic Press, 1989), Chap. 2.