Structure of microcrystalline silicon films deposited at very low temperatures by hot-wire CVD

Materials Science and Engineering B: Solid-State Materials for Advanced Technology

Volumn 69, Issue , 2000, Pages 536-541

  Peiro D ^a   Bertomeu, J ^a   Voz, C ^a   Fonrodona, M ^a   Soler, D ^a   Andreu, J ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; GRAIN BOUNDARIES; OXIDATION; PASSIVATION; SEMICONDUCTING SILICON;

HOT-WIRE CHEMICAL VAPOR DEPOSITION; HYDROGEN DILUTION;

SEMICONDUCTING FILMS;

EID: 0033895971     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(99)00319-0     Document Type: Article

References (19)

1. K. Yamamoto, T. Suzuki, M. Yoshimi, A. Nakajima, Proceedings of the 15th European Photovoltaic Solar Energy Conference, Vienna 1998 (H. S. Stephens and Associates, Bedford, UK) p. 1284.
2. H. Matsumura, Jpn. J. Appl. Phys. 8B 30 (1991) L1522.
3. J. Cifre, J. Bertomeu, J. Puigdollers, M.C. Polo, J. Andreu, A. Lloret, Appl. Phys. A59 (1994) 645.
4. J. Puigdollers, J. Cifre, M.C. Polo, J.M. Asensi, J. Bertomeu, J. Andreu, A. Lloret, Appl. Surf. Sci. 86 (1995) 600.
5. J.K. Rath, F.D. Tichelaar, H. Meiling, R.E.I. Schropp, Mat. Res. Symp. Proceed. 507 (1998) 879.
6. H. Matsumura, Jpn. J. Appl. Phys. 37 (1998) 3175.
7. D. Peiró, Ph. D. Thesis, University of Barcelona, 1999.
8. R. Tsu, J. González-Hernández, S.S. Chao, S.C. Lee, K. Tanaka, Appl. Phys. Lett. 40 (1982) 534.
9. W.B. Jackson, N.M. Johnson, D.K. Biegelsen, Appl. Phys. Lett. 43 (1983) 195.
10. H. Curtins, S. Veprek, Sol. State Comm. 57 (4) (1986) 215.
11. J. Bertomeu, J. Puigdollers, D. Peiró, J. Cifre, J.C. Delgado, J. Andreu, Mat. Sci. Eng. B36 (1996) 96.
12. E.C. Molenbroek, A.H. Mahan, A. Gallagher, J. Appl. Phys. 84 (4) (1909) 1997.
13. H. Meiling, A.M. Brockhoff, J.K. Rath, R.E.I. Schropp, Mater. Res. Symp. Proceed. 507 (1998) 31.
14. A. Matsuda, J. Non-Cryst. Solids 59-60 (1983) 767.
15. K. Nakamura, K. Yoshida, S. Takeoka, I. Shimizu, Jpn. J. Appl. Phys. 34 (1995) 442.
16. a Conferencia de dispositivos electrónicos (CDE-99) Madrid 1999, pp. 429-432.
17. H.N. Wanka, R. Zedlitz, M. Heintze, M.B. Schubert. Proc. of the 13th EPVSEC, Barcelona 1995 (H. S. Stephens and Associates, Bedford, UK) p. 1753.
18. A.H. Mahan, M. Vanecek, A. Poruba, V. Vorlicek, R.S. Crandall, D.L. Williamson, Mater. Res. Symp. Proceed. 507 (1998) 825.
19. N. Beck, J. Meier, J. Fric, Z. Remes, A. Poruba, R. Flückiger, J. Pohl, A. Shah, M. Vanecek, J. Non-Cryst. Solids 198-200 (1996) 903.