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Volumn 7, Issue 2, 1998, Pages 130-135
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Laser-induced fluorescence measurements of absolute SiH densities in SiH4-H2 RF discharges and comparison with a numerical model
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
EMISSION SPECTROSCOPY;
FLUORESCENCE;
GLOW DISCHARGES;
LASER APPLICATIONS;
MATHEMATICAL MODELS;
RAYLEIGH SCATTERING;
SILANES;
THIN FILMS;
LASER INDUCED FLUORESCENCE SPECTROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
TWO DIMENSIONAL;
PLASMA DENSITY;
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EID: 0032071997
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/7/2/006 Document Type: Review |
Times cited : (9)
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References (20)
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