Characterization of residues on anhydrous HF gas-phase etching of sacrificial oxides for surface micromachining

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 1, 2000, Pages 337-342

  Jang, Won Ick ^a   Choi, Chang Auck ^a   Lee, Jong Hyun ^a   Jun, Chi Hoon ^a   Yang, Haesik ^a   Kim, Youn Tae ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; ETCHING; MICROMACHINING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; STICTION; SURFACE TREATMENT; THICKNESS MEASUREMENT;

GAS PHASE ETCHING; SACRIFICIAL OXIDE; SURFACE MICROMACHINING;

OXIDES;

EID: 0033889989     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.39.337     Document Type: Article

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