Gas-phase etching of TEOS and PSG sacrificial layers using anhydrous HF and CH3OH

Journal of the Korean Physical Society

Volumn 30, Issue 3, 1997, Pages 628-631

  Chung, Hoi Hwan ^a   Jang, Won Ick ^a   Lee, Chang Seung ^a   Lee, Jong Hyun ^a   Yoo, Hyung Joun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0031500378     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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