Electrical characterization of rapid thermal annealed radio frequency sputtered silicon oxide films

Journal of Applied Physics

Volumn 80, Issue 10, 1996, Pages 5837-5842

  Choi, W K ^a   Choo, C K ^a   Lu, Y F ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0042904628     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363576     Document Type: Review

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