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Volumn 39, Issue 2, 1996, Pages 63-74

Rapid thermal processing for ULSI applications: An overview

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0004953118     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (9)

References (19)
  • 3
    • 6144248811 scopus 로고
    • Comparison of rapid-thermal processing and furnace processing for quarter-micron CMOS
    • SRC publication C93799 Feb.
    • B. El-Kareh, et. al, "Comparison of rapid-thermal processing and furnace processing for quarter-micron CMOS," Proceedings of the SRC, SRC publication C93799 (Feb. 1994).
    • (1994) Proceedings of the SRC
    • El-Kareh, B.1
  • 4
    • 0022820430 scopus 로고
    • Rapid thermal oxidation of silicon
    • S.T. Ang, J.J. Wortman, "Rapid thermal oxidation of silicon," J. Electrochem. Soc., 133 (11) 2361 (1986).
    • (1986) J. Electrochem. Soc. , vol.133 , Issue.11 , pp. 2361
    • Ang, S.T.1    Wortman, J.J.2
  • 10
    • 0003103474 scopus 로고
    • Manufacturing equipment issues in rapid thermal processing
    • ed. R.B. Fair, Academic Press
    • F. Roozeboom, "Manufacturing equipment issues in rapid thermal processing," Rapid Thermal Processing: Science and Technology, ed. R.B. Fair, Academic Press, p. 351 (1993).
    • (1993) Rapid Thermal Processing: Science and Technology , pp. 351
    • Roozeboom, F.1
  • 12
    • 6144265664 scopus 로고
    • Rapid thermal processor with dynamic spatial control and emissivity-independent temperature sensing
    • Monterey, Ca. Aug.
    • G. Miner, C. Gronet, B. Peuse, J. Grilli, "Rapid thermal processor with dynamic spatial control and emissivity-independent temperature sensing," 2nd Int'l Rapid Thermal Processing Conference, Monterey, Ca. (Aug. 1994).
    • (1994) 2nd Int'l Rapid Thermal Processing Conference
    • Miner, G.1    Gronet, C.2    Peuse, B.3    Grilli, J.4
  • 13
    • 5944241352 scopus 로고
    • Application of rapid thermal procesing in manufacturing: The effect of emissivity and coupling
    • Scottsdale, AZ Sept.
    • J. Nakos, "Application of rapid thermal procesing in manufacturing: The effect of emissivity and coupling," 1st Int'l Rapid Thermal Processing Conference, Scottsdale, AZ (Sept. 1993).
    • (1993) 1st Int'l Rapid Thermal Processing Conference
    • Nakos, J.1
  • 14
    • 0001150263 scopus 로고
    • Spectral emissivity of silicon
    • T. Sato, "Spectral emissivity of silicon," Japan J. Appl. Phys., 6, 339 (1967).
    • (1967) Japan J. Appl. Phys. , vol.6 , pp. 339
    • Sato, T.1
  • 15
    • 6144278002 scopus 로고
    • Improved RTP repeatability using advanced temperature measurement and control concepts
    • Scottsdale, Az. Sept.
    • J. Gelpey, B. Peuse, C. Manzanilla, "Improved RTP repeatability using advanced temperature measurement and control concepts," 1st Int'l Rapid Thermal Processing Conference, Scottsdale, Az. (Sept. 1993).
    • (1993) 1st Int'l Rapid Thermal Processing Conference
    • Gelpey, J.1    Peuse, B.2    Manzanilla, C.3
  • 16
    • 0028745728 scopus 로고
    • Influence of backend thermal processing on polysilicon-monosilicon contact resistance due to dopant deactivation
    • Oct.10-11,1994, Minneapolis, IEEE, 15.4
    • Asanga H. Perera, William J. Taylor, Marius Orlowski, "Influence of backend thermal processing on polysilicon-monosilicon contact resistance due to dopant deactivation," Proc. BCTM, Oct.10-11,1994, Minneapolis, IEEE, 15.4, 242 (1994).
    • (1994) Proc. BCTM , pp. 242
    • Perera, A.H.1    Taylor, W.J.2    Orlowski, M.3
  • 17
    • 6144287621 scopus 로고
    • The MMST program: An overview
    • Robert Doering, "The MMST program: An overview," Solid State Technology, vol. 37, p. 31 (1994).
    • (1994) Solid State Technology , vol.37 , pp. 31
    • Doering, R.1
  • 18
    • 0026679382 scopus 로고
    • Single wafer integrated semiconductor processing
    • M.M. Moslehi, et. al, "Single wafer integrated semiconductor processing," IEEE Trans. Electron Devices, 39 (1), 4 (1992).
    • (1992) IEEE Trans. Electron Devices , vol.39 , Issue.1 , pp. 4
    • Moslehi, M.M.1
  • 19
    • 6144239041 scopus 로고
    • Cost of ownership analysis of the manufacturing goals for rapid thermal processors to be used in 0.25 micron manufacturing
    • Scottsdale, AZ Sept.
    • L.A. Larson, R.A. Martinez, D. Lindholm, "Cost of ownership analysis of the manufacturing goals for rapid thermal processors to be used in 0.25 micron manufacturing," 1st Int'l Rapid Thermal Processing Conference, Scottsdale, AZ (Sept. 1993).
    • (1993) 1st Int'l Rapid Thermal Processing Conference
    • Larson, L.A.1    Martinez, R.A.2    Lindholm, D.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.