Surface-initiated ring-opening metathesis polymerization on Si/SiO2

Macromolecules

Volumn 33, Issue 8, 2000, Pages 2793-2795

  Kim, Namyong Y ^a   Jeon, Noo Li ^b   Choi, Insung S ^b   Takami, Seiichi ^d   Harada, Yoshiko ^c   Finnie, Krista R ^c   Girolami, Gregory S ^c   Nuzzo, Ralph G ^c   Whitesides, George M ^b   Laibinis, Paul E ^d  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b HARVARD UNIVERSITY   (United States)

^c UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^d USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VARIABLES CONTROL; ELLIPSOMETRY; FILM GROWTH; FILM PREPARATION; INFRARED SPECTROSCOPY; INITIATORS (CHEMICAL); PLASTIC FILMS; RING OPENING POLYMERIZATION; SILICA;

NORBORNENE; RING-OPENING METATHESIS POLYMERIZATION (ROMP); SURFACE-INITIATED POLYMERIZATION;

POLYSILANES;

EID: 0033743752     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma000046c     Document Type: Article

References (23)

1. Watson, K. J.; Zhu, J.; Nguyen, S. T.; Mirkin, C. A. J. Am. Chem. Soc. 1999, 121, 462-463.
2. (b) Weck, M.; Jackiw, J. J.; Rossi, R. R.; Weiss, P. S.; Grubbs, R. H. J. Am. Chem. Soc. 1999, 121, 4088-4089.
3. Makovetsky, K. L.; Finkelshtein, E. S.; Ostrovskaya, I. Y.; Portnykh, E. B.; Gorbacheva, L. I.; Golber, A. I.; Ushakov, N. V.; Yampolsky, Y. P. J. Mol. Catal. 1992, 76, 107-121.
4. (b) Schwab, P.; Grubbs, R. H.; Ziller, J. W. J. Am. Chem. Soc. 1996, 118, 100-110.
5. Recent reports of surface-initiated polymerization, (a) Huang, X.; Wirth, M. J. Anal. Chem. 1997, 69, 4577-4580.
6. (b) Jordan, R.; Ulman, A. J. Am. Chem. Soc. 1998, 720, 243-247.
7. (c) Prucker, O.; Ruhe, J. Macromolecules 1998, 31, 602-613.
8. (d) Jordan, R.; Ulman, A.; Kang, J. F.; Rafailovich, M. H.; Sokolov, J. J. Am. Chem. Soc. 1999, 121, 1016-1022.
9. (e) Husemann, M.; Malmstrom, E. E.; McNamara, M.; Mate, M.; Mecerreyes, D.; Benoit, D. G.; Hedrick, J. L.; Mansky, P.; Huang, E.; Russell, T. P.; Hawker, C. J. Macromolecules 1999, 32, 1424-1431.
10. (f) Husemann, M.; Mecerreyes, D.; Hawker, C. J.; Hedrick, J. L.; Shah, R.; Abbott, N. L. Angew. Chem., Int. Ed. Engl. 1999, 38, 647-649.
11. (g) Zhao, B.; Brittain, W. J. J. Am. Chem. Soc. 1999, 121, 3557-3558.
12. (h) Matyjaszewski, K.; Miller, P. J.; Shukla, N.; Immaraporn, B.; Gelman, A.; Luokala, B. B.; Siclovan, T. M.; Kickelbick, G.; Valiant, T.; Hoffmann, H.; Pakula, T. Macromolecules 1999, 32, 8716-8724.
13. All reactions used anhydrous solvents and were performed under a nitrogen atmosphere in a glovebox.
14. See Supporting Information for an IR spectrum of poly-4 prepared in solution by 1.
15. Kennedy, J. P.; Markowski, H. S. J. Macromol. Sci., Chem. 1967, 3, 345-370.
16. By XPS, the atomic ratio of C to Br was roughly 12:1 and close to the expected empirical ratio of 13:1 based on the polymer structure.
17. We obtained polymer films as thick as 1 μm using the neat monomer.
18. We have not yet determined the grafting density and chain lengths for the polymer chains due to the small amounts of polymer prepared on the employed flat substrates.
19. 2 for 10-30 min before exposure to a monomer solution produced films of diminished thicknesses (by ∼50% or more).
20. 3g An advantage of ROMP may be the possibility of forming a family of layered films by varying the sequence of exposure to a set of different norbornenyl monomers.
21. Xia, Y.; Whitesides, G. M. Angew. Chem., Int. Ed. Engl. 1998, 37, 550-575.
22. Lackowski, W. M.; Ghosh, P.; Crooks, R. M. J. Am. Chem. Soc. 1999, 121, 1419-1420.
23. The patterned polymer can be used as an etch resist to transfer the pattern into a Si substrate. Jeon, N. L.; Choi, I. S.; Kim, N. Y.; Harada, Y.; Finnie, K. R.; Girolami, G. S.; Nuzzo, R. G.; Laibinis, P. E.; Whitesides, G. M. Appl. Phys. Lett. 1999, 75, 4201-4203.