Strategies for the reduction of pattern effects

Materials Research Society Symposium - Proceedings

Volumn 429, Issue , 1996, Pages 71-76

  Kersch, A ^a   Schafbauer, T ^a   Deutschmann, L ^a  

^a SIEMENS AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; HEAT FLUX; LIGHT ABSORPTION; LIGHT EMISSION; LIGHTING; MIRRORS; MONTE CARLO METHODS; RADIATION;

HOT PROCESSES; PATTERN EFFECTS REDUCTION; RADIATION MODEL; RADIATIVE HEAT FLUX;

MATHEMATICAL MODELS;

EID: 0030400492     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)