Rapid thermal processing of semiconductor wafers: An optimized approach using gas conduction in the molecular regime

Journal of the Electrochemical Society

Volumn 144, Issue 2, 1997, Pages 753-758

  Daviet, Jean François ^a,b  

^a CTP Incorporated   (United States)

^b MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GASES; HEAT CONDUCTION; HEAT TRANSFER; MICROELECTRONICS; MOLECULES; SILICON WAFERS; TEMPERATURE MEASUREMENT;

GAS CONDUCTION; INFRARED THERMOMETRY; RAPID THERMAL PROCESSING;

ANNEALING;

EID: 0031075791     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837480     Document Type: Article

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