Stress, hydration, and optical absorption in ion-implanted aluminum oxide

Materials Science and Engineering: A

Volumn 253, Issue 1-2, 1998, Pages 71-77

  Arnold, G W ^a  

^a Consultants International ^*  (United States)

Author keywords

Al2O3; Hydration; Ion implantation; O vacancy production; Stress

Indexed keywords

ALUMINA; CRYSTAL DEFECTS; DEPOSITION; ELECTRON ENERGY LEVELS; HYDRATION; ION IMPLANTATION; LIGHT ABSORPTION; MECHANICAL VARIABLES MEASUREMENT; SATURATION (MATERIALS COMPOSITION); STRESSES; SURFACE TREATMENT;

COLLISIONAL DEPOSITION ENERGIES; ION BEAM MODIFICATION; OXYGEN VACANCY PRODUCTION;

SEMICONDUCTING ALUMINUM COMPOUNDS;

EID: 0040712417     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0921-5093(98)00711-4     Document Type: Article

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