Anisotropic-etching process simulation system MICROCAD analyzing complete 3D etching profiles of single crystal silicon

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 412-417

  Asaumi, Kazuo ^a   Iriye, Yasuroh ^a   Sato, Kazuo ^a  

^a Fuji Research Institute Corporation   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; DATABASE SYSTEMS; SILICON; SINGLE CRYSTALS;

SOFTWARE PACKAGE MICROCAD;

ETCHING;

EID: 0030703018     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)