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Volumn E83-C, Issue 4, 2000, Pages 585-590
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Cubic GaN light emitting diode grown by metalorganic vapor-phase epitaxy
a a
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NTT CORPORATION
(Japan)
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Author keywords
Cubic gan; Light emitting diode; Mg doping; P n junction; Si doping
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Indexed keywords
ELECTRODES;
ELECTROLUMINESCENCE;
ELECTRON BEAMS;
ENERGY GAP;
HETEROJUNCTIONS;
MAGNESIUM;
METALLORGANIC VAPOR PHASE EPITAXY;
SEMICONDUCTING GALLIUM COMPOUNDS;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR GROWTH;
SUBSTRATES;
CUBIC GALLIUM NITRIDE LIGHT EMITTING DIODE;
ELECTRON BEAM INDUCED CURRENT;
MAGNESIUM DOPING;
SILICON DOPING;
LIGHT EMITTING DIODES;
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EID: 0033715362
PISSN: 09168524
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (3)
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References (12)
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