ZnSe growth by radical assisted MOCVD using hollow cathode plasma

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 244-248

  Aoki, Toru ^a   Ikeda, Takeshi ^a   Korzec, Dariusz ^b   Hatanaka, Yoshinori ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

^b UNIVERSITY OF WUPPERTAL   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EPITAXIAL GROWTH; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; TITRATION; X RAY DIFFRACTION ANALYSIS;

HOLLOW CATHODE PLASMA; INDUCTIVE COUPLED PLASMA;

FILM GROWTH;

EID: 0033706121     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00774-4     Document Type: Article

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