ZnSe crystal growth by radical assisted MOCVD

Applied Surface Science

Volumn 100-101, Issue , 1996, Pages 621-624

  Hatanaka, Yoshinori ^a   Aoki, Toru ^a   Morita, Motohiko ^a   Nakanishi, Yoichiro ^a  

^a SHIZUOKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITROGEN; PLASMAS; SEMICONDUCTING SILICON; SEMICONDUCTING ZINC COMPOUNDS; SEMICONDUCTOR DOPING; SURFACE PHENOMENA;

DIETHYLZINC; HETEROEPITAXIAL GROWTH; SELENIUM HYDRIDE; ZINC SELENIDE;

EPITAXIAL GROWTH;

EID: 0030564403     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/0169-4332(96)00351-0     Document Type: Article

References (6)

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4. G.B. Kistiakowsky and G.G. Volpi, J. Chem. Phys. 27 (1957) 1141.
5. S. Meikle and Y. Hatanaka, Appl. Phys. Lett. 54 (1989) 1648.
6. J.M. Depuydt, M.A. Hasse, H. Cheng and J.E. Potts, 55 (1989) 1103.