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Applied Surface Science

Volumn 92, Issue , 1996, Pages 132-137

Growth of ZnSe thin films by radical assisted MOCVD method

(5) Aoki, T a Morita, M a Wickramanayaka, S a Nakanishi, Y a Hatanaka, Y a

a SHIZUOKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTIONS; EPITAXIAL GROWTH; FREE RADICALS; GLOW DISCHARGES; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SEMICONDUCTING SELENIUM COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; TEMPERATURE; THIN FILMS;

DIETHYLZINC; GROWTH RATE; HYDROGEN RADICALS; REACTIVITY; SELENIUM HYDRIDE; ZINC SELENIDE THIN FILMS;

FILM GROWTH;

EID: 0030562326 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/0169-4332(95)00216-2 Document Type: Article

Times cited : (11)

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