Effect of activation of oxygen by electron cyclotron resonance plasma on the incorporation of Pb in the deposition of Pb(Zr,Ti)O3 films by DC magnetron reactive sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 9 A, 1997, Pages 5663-5669

  Kim, Sung Tae ^b   Kim, Hyun Ho ^a   Kim, Yong Il ^a   Lee, Moon Yong ^b   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

ECR plasma; Lead zirconate titanate; Sputtering; Thin film

Indexed keywords

CHEMICAL ACTIVATION; ELECTRON CYCLOTRON RESONANCE; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; SUBSTRATES; THIN FILMS;

ELECTRON CYCLOTRON RESONANCE PLASMAS; LEAD ZIRCONATE TITANATE;

DIELECTRIC FILMS;

EID: 0031220601     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.5663     Document Type: Article

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