Investigation of Pt/Ti bottom electrodes for Pb(Zr,Ti)O3 films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 1 A, 1997, Pages 294-300

  Kim, Sung Tae ^a   Kim, Hyun Ho ^a   Lee, Moon Yong ^b   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Annealing; ECR plasma; Electrode; Ferroelectric thin films; Pt; PZT; Sputtering

Indexed keywords

LEAD ZIRCONATE TITANATE FILMS;

ANNEALING; AUGER ELECTRON SPECTROSCOPY; FERROELECTRIC MATERIALS; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; PLATINUM; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; THERMAL EFFECTS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

LEAD COMPOUNDS;

EID: 0030708259     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.36.294     Document Type: Article

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