Field-emission characteristics of chemical vapor deposition-diamond films

Thin Solid Films

Volumn 370, Issue 1, 2000, Pages 63-69

  Peng, X L ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; FIELD EMISSION CATHODES; MIXTURES; MORPHOLOGY; PLASMA ETCHING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON;

FIELD EMISSION; HOT FILAMENT CHEMICAL VAPOR DEPOSITION; TURN ON FIELDS;

DIAMOND FILMS;

EID: 0033691186     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00721-5     Document Type: Article

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