Field emission properties of the polycrystalline diamond film prepared by microwave-assisted plasma chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 2, 1998, Pages 712-715

  Kwon, Sang Jik ^a   Shin, Young Hwa ^a   Aslam, Dean M ^b   Lee, Jong Duk ^c  

^a Gachon University College of Medicine   (South Korea)

^b Michigan State University   (United States)

^c Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 11744386908     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589888     Document Type: Article

References (12)

1. F. J. Himpsel, J. A. Knapp, J. A. Van Vechten, and D. E. Eastman, Phys. Rev. B 20, 624 (1979).
2. J. V. D. Weide, Z. Zhang, P. K. Baumann, M. G. Wensell, J. Bernholc, and R. J. Nemanich, Phys. Rev. B 50, 5803 (1994).
3. J. V. D. Weide and R. J. Nemanich, Phys. Rev. B 49, 13629 (1994).
4. M. W. Geis, J. C. Twichell, J. Macaulay, and K. Okano, Appl. Phys. Lett. 67, 1328 (1995).
5. Z. H. Huang, P. H. Cutler, N. M. Miskovsky, and T. E. Sullivan, Appl. Phys. Lett. 65, 2562 (1994).
6. C. Bandis and B. B. Pate, Phys. Rev. Lett. 74, 777 (1995).
7. G. S. Yang, M. Aslam, K. P. Kuo, D. K. Reinhard, and J. Asmussen, J. Vac. Sci. Technol. B 13, 1030 (1995).
8. Y. L. Yang and M. P. D'Evelyn, J. Vac. Sci. Technol. A 10, 978 (1992).
9. J. V. Der Weide and R. J. Nemannich, Appl. Phys. Lett. 62, 1878 (1993).
10. S. H. Yang, D. A. Drabold, and J. B. Adams, Phys. Rev. B 48, 5261 (1993).
11. W. Zhu, G. P. Kochnski, S. Jin, and L. Seibles, J. Appl. Phys. 78, 2707 (1995).
12. W. Zhu, G. P. Kochanski, S. Jin, L. Seibles, D. C. Jacobson, M. McCormack, and A. E. White, Appl. Phys. Lett. 67, 1157 (1995).