Electron field emission from diamond thin films with various surface morphologies and surface resistances

Journal of Physics D: Applied Physics

Volumn 30, Issue 16, 1997, Pages 2271-2275

  Li, Yunjun ^a   Yao, Ning ^a   He, Jintian ^a   Zhang, Binglin ^a   Gong, Zhiben ^b  

^a ZHENGZHOU UNIVERSITY   (China)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CURRENT DENSITY; ELECTRIC RESISTANCE; ELECTRON EMISSION; EMISSION SPECTROSCOPY; MOLYBDENUM; MORPHOLOGY; PLASMA APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

MICROWAVE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;

DIAMOND FILMS;

EID: 0031208232     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/30/16/003     Document Type: Article

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