Stress Distribution Around the Ion-induced Channels in Chemical Vapor Deposited Diamond Films: A Micro-Raman Study

Journal of Raman Spectroscopy

Volumn 29, Issue 7, 1998, Pages 567-574

  Dobal, P S ^a,b   Navati, M S ^a   Bist, H D ^a   Som, T ^a   Kulkarni, V N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^b VSSD College Kanpur   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; DEFECTS; DIAMOND FILMS; ION BOMBARDMENT; ION IMPLANTATION;

CHEMICAL VAPOR DEPOSITED; CHEMICAL VAPOR-DEPOSITED DIAMOND FILMS; HE ION IMPLANTATION; MICRO-RAMAN STUDIES; RAMAN LINES; SI SUBSTRATES; SPECTRA'S; STRESSES DISTRIBUTION; TARGET CURRENTS; VAPOR-DEPOSITED FILMS;

STRESS CONCENTRATION;

EID: 0000790178     PISSN: 03770486     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1097-4555(199807)29:7<567::aid-jrs255>3.3.co;2-a     Document Type: Article

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