-
2
-
-
0022958272
-
-
A. W. Yanof, D. J. Resnick, C. A. Jankoski, and W. A. Johnson, Proc. SPIE 632, 118 (1986).
-
(1986)
Proc. SPIE
, vol.632
, pp. 118
-
-
Yanof, A.W.1
Resnick, D.J.2
Jankoski, C.A.3
Johnson, W.A.4
-
3
-
-
0026992301
-
-
M. Oda, S. Ohki, A. Ozawa, T. Ohkubo, and H. Yoshihara, Jpn. J. Appl. Phys., Part 1 31, 4189 (1992).
-
(1992)
Jpn. J. Appl. Phys., Part 1
, vol.31
, pp. 4189
-
-
Oda, M.1
Ohki, S.2
Ozawa, A.3
Ohkubo, T.4
Yoshihara, H.5
-
5
-
-
0026973393
-
-
R. Kumar, T. Ohta, Y. Yamashita, H. Hoga, and K. Koga, Jpn. J. Appl. Phys., Part 1 31, 4195 (1992).
-
(1992)
Jpn. J. Appl. Phys., Part 1
, vol.31
, pp. 4195
-
-
Kumar, R.1
Ohta, T.2
Yamashita, Y.3
Hoga, H.4
Koga, K.5
-
6
-
-
0027849450
-
-
Y. Yamaguchi, N. Annaka, T. Shoki, I. Amemiya, H. Nagasawa, H. Kosuga, and O. Nagarekawa, Mater. Res. Soc. Symp. Proc. 306, 197 (1993).
-
(1993)
Mater. Res. Soc. Symp. Proc.
, vol.306
, pp. 197
-
-
Yamaguchi, Y.1
Annaka, N.2
Shoki, T.3
Amemiya, I.4
Nagasawa, H.5
Kosuga, H.6
Nagarekawa, O.7
-
8
-
-
0041002146
-
-
K. Suzuki, R. Kumar, H. Windischmann, H. Sano, Y. Iimura, H. Miyashita, and N. Watanabe, J. Vac. Sci. Technol. B 9, 3266 (1991).
-
(1991)
J. Vac. Sci. Technol. B
, vol.9
, pp. 3266
-
-
Suzuki, K.1
Kumar, R.2
Windischmann, H.3
Sano, H.4
Iimura, Y.5
Miyashita, H.6
Watanabe, N.7
-
9
-
-
0030232622
-
-
H. Noguchi, Y. Kubota, and T. Takarada, Jpn. J. Appl. Phys., Part 1 35, 4770 (1996).
-
(1996)
Jpn. J. Appl. Phys., Part 1
, vol.35
, pp. 4770
-
-
Noguchi, H.1
Kubota, Y.2
Takarada, T.3
-
10
-
-
36449006342
-
-
H. Windischmann, G. F. Epps, Y. Cong, and R. W. Collins, J. Appl. Phys. 69, 2231 (1991).
-
(1991)
J. Appl. Phys.
, vol.69
, pp. 2231
-
-
Windischmann, H.1
Epps, G.F.2
Cong, Y.3
Collins, R.W.4
-
11
-
-
0028742781
-
-
Y. H. Chiou, C. T. Hwang, M. Y. Han, J. H. Jou, Y. S. Chang, and H. C. Shih, Thin Solid Films 253, 119 (1994).
-
(1994)
Thin Solid Films
, vol.253
, pp. 119
-
-
Chiou, Y.H.1
Hwang, C.T.2
Han, M.Y.3
Jou, J.H.4
Chang, Y.S.5
Shih, H.C.6
-
13
-
-
0029253555
-
-
Y. K. Kim, J. H. Jung, J. Y. Lee, and H. J. Ahn, J. Mater. Sci. 6, 28 (1995).
-
(1995)
J. Mater. Sci.
, vol.6
, pp. 28
-
-
Kim, Y.K.1
Jung, J.H.2
Lee, J.Y.3
Ahn, H.J.4
-
16
-
-
36549103143
-
-
M. Yoshikawa, G. Katagiri, H. Ishida, A. Ishitani, and T. Akamatsu, J. Appl. Phys. 64, 6464 (1988).
-
(1988)
J. Appl. Phys.
, vol.64
, pp. 6464
-
-
Yoshikawa, M.1
Katagiri, G.2
Ishida, H.3
Ishitani, A.4
Akamatsu, T.5
-
20
-
-
0345063563
-
-
E. I. Bromley, J. N. Randall, D. C. Flanders, and R. W. Mountain, J. Vac. Sci. Technol. B 1, 1364 (1983).
-
(1983)
J. Vac. Sci. Technol. B
, vol.1
, pp. 1364
-
-
Bromley, E.I.1
Randall, J.N.2
Flanders, D.C.3
Mountain, R.W.4
-
22
-
-
0029488673
-
-
M. Oda, A. Une. I. Okada, S. Shinohara, Y. Nakayama, and H. Yoshihara, Jpn. J. Appl. Phys., Part 1 34, 6729 (1995).
-
(1995)
Jpn. J. Appl. Phys., Part 1
, vol.34
, pp. 6729
-
-
Oda, M.1
Une, A.2
Okada, I.3
Shinohara, S.4
Nakayama, Y.5
Yoshihara, H.6
-
23
-
-
11744357872
-
-
Yokohama, Japan, 14-15 July unpublished
-
Y. Tanaka, T. Yoshihara, S. Tsuboi, K. Fujii, and K. Suzuki, 1997 International Workshop on X-ray and Extreme Ultraviolet Lithography, Yokohama, Japan, 14-15 July 1997 (unpublished).
-
(1997)
1997 International Workshop on X-ray and Extreme Ultraviolet Lithography
-
-
Tanaka, Y.1
Yoshihara, T.2
Tsuboi, S.3
Fujii, K.4
Suzuki, K.5
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