Flow control by using high-aspect-ratio, in-plane microactuators

Sensors and Actuators, A: Physical

Volumn 73, Issue 1-2, 1999, Pages 169-175

  Sherman, Faiz ^a   Tung, Steve ^a   Kim, Chang Jin ^a   Ho, Chih Ming ^a   Woo, Jason ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b Department of Civil and Environmental Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRAG; ELECTROSTATICS; FLOW CONTROL; REACTIVE ION ETCHING; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS; SUBSTRATES; VISCOUS FLOW;

DEEP REACTIVE ION ETCHING (DRIE);

MICROACTUATORS;

EID: 0033537537     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(98)00267-2     Document Type: Article

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