Atomic step dynamics on periodic semiconductor surface structures

Journal of Electron Microscopy

Volumn 48, Issue 6, 1999, Pages 747-752

  Blakely, Jack M ^a   Tanaka, So ^a,c   Tromp, Ruud M ^a,b  

^a School of Chemical and Molecular Engineering   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c SUMITOMO ELECTRIC INDUSTRIES LTD   (Japan)

Author keywords

Atomic force microscopy; Evaporation; Low energy electron microscopy; Step free surfaces; Surface atomic steps; Surface diffusion

Indexed keywords

CRYSTAL ATOMIC STRUCTURE; ELECTRON MICROSCOPES; ELECTRONS; PERIODIC STRUCTURES; SURFACE DIFFUSION;

2 - DIMENSIONAL; ATOMIC STEP; ATOMIC-FORCE-MICROSCOPY; LOW ENERGY ELECTRON MICROSCOPY; PROPERTY; SEMI-CONDUCTOR SURFACES; SI SURFACES; STEP DYNAMICS; STEP-FREE SURFACE; SURFACE ATOMIC STEP;

ATOMIC FORCE MICROSCOPY;

EID: 0033492588     PISSN: 00220744     EISSN: None     Source Type: Journal    
DOI: 10.1093/oxfordjournals.jmicro.a023744     Document Type: Conference Paper

References (12)

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