Electromigration study of AI thin films deposited on low dielectric polyimide and SiO 2 ILD

Journal of the Korean Physical Society

Volumn 35, Issue SUPPL. 2, 1999, Pages

  Eun, Byung Soo ^a   Kim, Young Ho ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033412589     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (14)

1. W. W. Lee and P. S. Ho, MRS Bulletin 22, 19 (1997).
2. R. S. List, A. Singh and A. R. Ralston, MRS Bulletin 22, 61 (1997).
3. E. T. Ryan, A. J. Mckerrow, J. Leu and P. S. Ho, MRS Bulletin 22, 49 (1997).
4. N. P. Hacker, MRS Bulletin 22, 33 (1997).
5. S. P. Jeng, R. H. Havemann and M. G. Chang, Mat. Res. Soc. Symp. Proc. 337, 25 (1994).
6. S. Q. Wang and P. S. Ho, J. Vac. Sci. Technol. B14, 174 (1996).
7. D. Burdeaux, P. Townsend, J. Carr and P. Garrou, J. Elec. Mat. 19, 1357 (1990).
8. S. H. Kang, C. Kim and J. W. Morris, J. Appl. Phys. 79, 8330 (1996).
9. C. Kim and J. W. Morris, J. Appl. Phys. 73, 4885 (1993).
10. S. Vaidya and A. K. Sinha, Thin Solid Films 75, 253 (1981).
11. C. H. Ting and T. E. Seidel, Mat. Res. Symp. Proc. 385 (1995).
12. J. E. Palmer and C. V. Thompson, J. Appl. Phys. 69, 3929 (1991).
13. B. S. Eun and Y. H. Kim, Bull. Kor. Inst. Met. & Mater. 11, 510 (1998).
14. C. G. Kim, Ph.D. Dissertation (Lawrence Berkeley Lab., California, 1993), p. 141.