Characteristics of gap fill and planarization of fluorinated polyimide FPI-45M films

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 174-178

  Wang, Shi Qing ^a,b   Zhao, Bin ^a  

^a SEMATECH   (United States)

^b NATIONAL SEMICONDUCTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 4243164804     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589022     Document Type: Article

References (1)

1. The National Technology Roadmap for Semiconductors (Semiconductor Industry Association, San Jose, CA, 1994).