Mechanical properties of SU-8

Materials Research Society Symposium - Proceedings

Volumn 546, Issue , 1999, Pages 213-218

  Mcaleavey, A ^a   Coles, G ^a   Edwards, R L ^a   Sharpe Jr , W N ^a  

^a JOHNS HOPKINS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELASTIC MODULI; STRAIN; STRENGTH OF MATERIALS; STRESS ANALYSIS;

ULTRATHICK PHOTORESISTS;

PHOTORESISTS;

EID: 0033356304     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

1. Lee, K. Y. and 6 co-authors, Micromachining Applications of a High Resolution Ultrathick Photoresist, J. of Vac. Sci. Technol., pp. 3012-3016 (1995).
2. Despont, M., and 5 co-authors, High-Aspect-Ratio Ultrathick Negative-Tone Near-UV Photoresist for MEMS Applications, Proc. Tenth IEEE Int'l. Workshop on MEMS, Nagoya, Japan, pp. 518-522(1997).
3. Lorenz, H. and 5 co-authors SU-8: a Low-Cost Negative Resist for MEMS, J. Micromech. Microeng., pp. 121-124 (1997).
4. Lorenz, H. and 5 co-authors, High-Aspect-Ratio, Ultrathick, Negative-Tone Near-UV Photoresist and its Applications for MEMS, Sensors and Actuators A 64, pp. 33-39 (1998).
5. Lorenz, H., M. Despont, P. Vettiger, and P. Renaud, Fabrication of Photoplastic High-Aspect Ratio Microparts and Micromolds using SU-8 UV Resist, Microsyst. Tech., pp. 143-146 (1998).
6. Lorenz, H., M. Laudon, and P. Renaud, Mechanical Characterization of a New High-Aspect-Ratio Near UV-Photoresist, Microelect. Engr., pp. 371-374 (1998).
7. Sharpe, W. N., Jr., LaVan, D. A. and Edwards R. L., Mechanical Properties of LIGA-Deposited Nickel for MEMS Transducers, Proceedings of Transducers '97, Chicago, IL, pp. 607-610 (1997).
8. Sharpe, W. N., Jr., Yuan, B., and Edwards, R. L., A New Technique for Measuring the Mechanical Properties of Thin Films, J. of Microelectromechanical Systems, pp.193-199 (1997).
9. LaVan, D. A. and Sharpe, W. N., Jr., Tensile Testing of Microsamples, Experimental Mechanics, in press, (1998).