Lattice location of implanted Cu in Si

Physica B: Condensed Matter

Volumn 273-274, Issue , 1999, Pages 367-370

  Wahl, U ^a   Correia, J G ^b   Vantomme, A ^a   Langouche, G ^a  

^a KU LEUVEN   (Belgium)

^b CERN   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; ION IMPLANTATION; SINGLE CRYSTALS;

LATTICE LOCATIONS;

SEMICONDUCTING SILICON;

EID: 0033356094     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(99)00479-2     Document Type: Article

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