Application of covariance structures to improve the fit of response surfaces to simulation data

IEEE Transactions on Semiconductor Manufacturing

Volumn 12, Issue 3, 1999, Pages 366-374

  Waring, Thomas G ^b   Walton, Anthony J ^a,c   Ferguson, Stuart ^d   Sprevak, Dan ^e  

^a IEEE   (United Kingdom)

^b St Mary's College   (United Kingdom)

^c UNIVERSITY OF EDINBURGH   (United Kingdom)

^d QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

^e UNIVERSITY OF ULSTER   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COVARIANCE TECHNIQUES; KRIGING TECHNIQUES; RESPONSE SURFACE METHODS; RESPONSE SURFACES; TECHNOLOGY COMPUTER AIDED DESIGN;

COMPUTER AIDED DESIGN; COMPUTER SIMULATION; ELECTRIC BREAKDOWN; INTERPOLATION; ION IMPLANTATION; LEAST SQUARES APPROXIMATIONS; OPTIMIZATION; RANDOM ERRORS; SEMICONDUCTOR DEVICE MODELS; THRESHOLD VOLTAGE; VLSI CIRCUITS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0033349090     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.778205     Document Type: Article

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