H- laser photodetachment at 1064, 532, and 355 nm in plasma

Journal of Applied Physics

Volumn 83, Issue 6, 1998, Pages 2944-2949

  Nishiura, M ^a   Sasao, M ^b   Bacal, M ^c  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

^c ECOLE POLYTECHNIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000754186     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367083     Document Type: Article

References (12)

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