Analysis of surface photoabsorption spectra of (001) InP surfaces

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 9 A, 1999, Pages 5033-5036

  Kim, Young Dong ^a   Lee, Tae Wan ^b   Hwang, Heedon ^c   Moon, Youngboo ^a   Yoon, Euijoon ^b   Nakamura, Fumihiko ^c  

^a Kyung Hee University   (South Korea)

^b Seoul National University   (South Korea)

^c SONY CORPORATION   (Japan)

Author keywords

In dimer; In situ monitoring; Inp; MOCVD; P dimer; Surface photoabsorption

Indexed keywords

ABSORPTION SPECTROSCOPY; CRYSTAL ORIENTATION; DIMERS; LIGHT ABSORPTION; MATHEMATICAL MODELS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PARTIAL PRESSURE; PRESSURE EFFECTS; SEMICONDUCTING INDIUM PHOSPHIDE; SURFACE STRUCTURE;

SUBTRACTION SPECTROSCOPY; SURFACE PHOTOABSORPTION (SPA) SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0033341843     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.5033     Document Type: Article

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