In situ ultrasonic monitoring of photoresist development

Applied Physics Letters

Volumn 73, Issue 15, 1998, Pages 2215-2217

  Morton, Susan L ^a   Degertekin, F Levent ^a   Khuri Yakub, B T ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21544477024     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122427     Document Type: Article

References (5)

1. L. Lauchlan, K. Satteur, T. Batchelder, and J. Irwin, Advances in Resist Technology and Processing II, Proc. SPIE No. 539 (SPIE, Bellingham, 1985), p. 227.
2. L. F. Thompson, in Introduction to Microlithography, 2nd ed., edited by L. F. Thompson, C. G. Willson, and M. J. Bowden (American Chemical Society, Washington, D.C., 1994), Chap. 4.
3. M. Thompson, Solid State Technol. 33, 171 (1990).
4. S. L. Morton, F. L. Degertekin, and B. T. Khuri-Yakub, Appl. Phys. Lett. 72, 2457 (1998).
5. L. E. Kinsler, A. R. Frey, A. B. Coppens, and J. V. Sanders, Fundamentals of Acoustics, 3rd ed. (Wiley, New York, 1982), p. 127.