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Volumn 47, Issue 11, 1999, Pages 3227-3231
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New investigation of copper's role in enhancing Al-Cu interconnect electromigration resistance from an atomistic view
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ENERGY;
COMPOSITION EFFECTS;
COMPUTER SIMULATION;
COPPER;
DIFFUSION IN SOLIDS;
ELECTRIC CONTACTS;
ELECTRIC RESISTANCE;
GRAIN BOUNDARIES;
SEGREGATION (METALLOGRAPHY);
ELECTROMIGRATION LIFETIME;
INCUBATION DIFFUSION;
ALUMINUM ALLOYS;
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EID: 0033327867
PISSN: 13596454
EISSN: None
Source Type: Journal
DOI: 10.1016/S1359-6454(99)00186-X Document Type: Article |
Times cited : (69)
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References (20)
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