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Volumn 47, Issue 11, 1999, Pages 3227-3231

New investigation of copper's role in enhancing Al-Cu interconnect electromigration resistance from an atomistic view

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPOSITION EFFECTS; COMPUTER SIMULATION; COPPER; DIFFUSION IN SOLIDS; ELECTRIC CONTACTS; ELECTRIC RESISTANCE; GRAIN BOUNDARIES; SEGREGATION (METALLOGRAPHY);

EID: 0033327867     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(99)00186-X     Document Type: Article
Times cited : (69)

References (20)
  • 20
    • 85031580052 scopus 로고    scopus 로고
    • unpublished
    • Liu, X.-Y., unpublished
    • Liu, X.-Y.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.