Investigation of Cu films by focused ion beam induced deposition using nuclear microprobe

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 158, Issue 1, 1999, Pages 493-498

  Park, Y K ^a   Takai, M ^a   Lehrer, C ^b   Frey, L ^b   Ryssel, H ^b  

^a OSAKA UNIVERSITY   (Japan)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED CIRCUITS IIS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; COPPER; DEPOSITION; GALLIUM; GAS ADSORPTION; METALLIC FILMS; NUCLEAR INSTRUMENTATION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; THERMAL EFFECTS;

FOCUSED ION BEAMS (FIB); NUCLEAR MICROPROBES;

ION BOMBARDMENT;

EID: 0033311968     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(99)00501-7     Document Type: Article

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