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Applied Physics A: Materials Science and Processing

Volumn 66, Issue 6, 1998, Pages 629-637

Amorphous and crystalline IrSi Schottky barriers on silicon

(7) Worle D a Grunleitner H a Demuth, V a Kumpf, C a Strunk, H P a Burkel, E a,b Schulz, M a

a UNIVERSITY OF ERLANGEN NUREMBERG (Germany)

b UNIVERSITY OF ROSTOCK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTAL STRUCTURE; ELECTRONIC DENSITY OF STATES; IRIDIUM COMPOUNDS; LIGHT ABSORPTION; LIGHT EMISSION; OPTICAL VARIABLES MEASUREMENT; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY CRYSTALLOGRAPHY;

ELECTROOPTICAL PROPERTY; IRIDIUM SILICIDE FILM;

SCHOTTKY BARRIER DIODES;

EID: 0032096170 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050724 Document Type: Article

Times cited : (15)

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