A micro-fluorescent/diffracted x-ray spectrometer with a micro-x-ray beam formed by a fine glass capillary

Review of Scientific Instruments

Volumn 67, Issue 9, 1996, Pages 3051-3064

  Yamamoto, Naoki ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CAPILLARY TUBES; CONTAMINATION; CRYSTAL STRUCTURE; DETECTORS; GLASS; REFRACTIVE INDEX; STRAIN MEASUREMENT; STRESSES; ULSI CIRCUITS; X RAY SPECTROSCOPY; X RAYS;

ALUMINUM INTERCONNECTIONS; METAL CONTAMINATION; MICROFOCUS X RAY GENERATOR; TITANIUM SILICIDE; X RAY LIGHT PIPE; X RAY MICROBEAM;

X RAY SPECTROMETERS;

EID: 0030246484     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1147429     Document Type: Article

References (39)

1. P. M. Fahey, S. R. Mader, S. R. Stiffler, R. L. Mohler, J. D. Mis, and J. A. Slinkman, IBM J. Res. Dev. 36, 158 (1992).
2. N. Yamamoto, S. Iwata, and H. Kume, IEEE Trans. Electron Devices ED-34, 607 (1987).
3. S. R. Wilson, C. J. Tracy, and J. L. Freeman, Jr., Handbook of Multilevel Metallization Integrated Circuits (Noyes, Park Ridge, NJ, 1993), Chap. 6, p. 170.
4. M. A. Korhonen and P. Børgesen, J. Appl. Phys. 73, 3790 (1993).
5. I.-S. Yeo and P. S. Ho, J. Appl. Phys. 78, 945 (1995).
6. N. G. Einspruch and G. B. Larrabee, VLSI Electronics Microstructure Science, Materials and Process Characterization (Academic, New York, 1983), Vol. 6, Chap. 1, p. 1.
7. P. Kirkpatrick and A. V. Baze, J. Opt. Soc. Am. 38, 756 (1948).
8. V. I. Wolter, Ann. Phys. (Leipzig) 10, 286 (1952).
9. V. E. Cosslett and W. C. Nixon, X-ray Microscopy (Cambridge University Press, Cambridge, 1960), Chaps. 4 and 5.
10. R. V. Pound and G. A. Rebka, Phys. Rev. 3, 439 (1959).
11. A. V. Baez, J. Opt. Soc. Am. 42, 756 (1952).
12. H. Rarback, D. Shu, S. C. Feng, H. Ade, J. Kiz, I. McNulty, D. P. Kerm, T. H. P. Chang, Y. Vladimirsky, N. Iskander, D. Attwood, K. McQuaid, and S. Rothman, Rev. SCi. Instrum. 59, 52 (1988).
13. C. Jacobsen, S. Williams, E. Anderson, M. T. Browne, C. J. Burckley, D. Kern, J. Kirz, M. Rivers, and X. Zhang, Opt. Commun. 86, 351 (1991).
14. C.-H. Ko, J. Kiz, H. Ade, E. Johnson, S. Hulbert, and E. Anderson, Rev. SCi. Instrum. 66, 1416 (1995).
15. A. Rindby, Nucl. Instrum. Methods A 249, 536 (1986).
16. N. Yamamoto and Y. Hosokawa, Jpn. J. Appl. Phys. 27, L2203 (1988).
17. E. A. Stern, Z. KaLman, A. Lewis, and L. Lieberman, Appl. Opt. 27, 5135 (1988).
18. P. Engström, S. Larsson, and A. Rindby, Nucl. Instrum. Methods A 302, 547 (1991).
19. D. J. Thiel, D. H. Bilderback, A. Lewis, E. A. Stern, and T. Rich, Appl. Opt. 31, 987 (1992).
20. G. Bernasconi, N. Haselberger, A. Markowicz, and V. Valkovic, Nucl. Instrum. Methods B 86, 333 (1994).
21. D. H. Bilderback, S. A. Hoffman, and D. J. Thiel, Science 263, 201 (1994).
22. S. B. Dabagov, S. V. Nikitina, M. A. Kumakhov, N. S. Ibraimov, G. A. Vartaniants, A. N. Nikitin, and L. Spielberger, Nucl. Instrum. Methods B 103, 99 (1995).
23. J. H. Underwood, A. C. Thompson, Y. Wu, and R. D. Giauque, Nucl. Instrum. Methods A 266, 296 (1988).
24. R. W. Ryon and W. K. Warburton, Adv. X-ray Anal. 35, 1227 (1992).
25. H. Takenaka, Y. Muramatsu, H. Takaoka, Y. Ishii, and H. Hashizume, Rev. Sci. Instrum. 60, 2018 (1989).
26. T. Yamada, M. Yuri, H. Onuki, and S. Ishizaka, Rev. Sci. Instrum. 66, 1493 (1995).
27. E. F. Kaelble, Handbook of X-rays (McGraw-Hill, New York, 1967), Chap. 48, p. 48-2.
28. R. W. Hendrick, J. Opt. Soc. Am. 47, 165 (1957).
29. A. P. Lukirskii, E. P. Savion, O. A. Ershov, and Y. F. Shepelev, Opt. Spectrosk. (USSR) 16, 168 (1964).
30. B. L. Henke, P. Lee, T. J. Tanaka, R. L. Shimabukuro, and B. K. Fujikawa, AIP Conf. Proc. 75, 340 (1981), or At. Data Nucl. Data Tables 27, 1 (1982); B. L. Henke, J. C. Davis, E. M. Gullikson, and R. C. C. Perera, A preliminary report on x-ray photoabsorption coefficients and atomic scattering factors for 92 elements in the 10-10000 eV region, Lawrence Berkeley Laboratory, University of California, Nov. 1988.
31. B. L. Henke, P. Lee, T. J. Tanaka, R. L. Shimabukuro, and B. K. Fujikawa, AIP Conf. Proc. 75, 340 (1981), or At. Data Nucl. Data Tables 27, 1 (1982); B. L. Henke, J. C. Davis, E. M. Gullikson, and R. C. C. Perera, A preliminary report on x-ray photoabsorption coefficients and atomic scattering factors for 92 elements in the 10-10000 eV region, Lawrence Berkeley Laboratory, University of California, Nov. 1988.
32. B. L. Henke, P. Lee, T. J. Tanaka, R. L. Shimabukuro, and B. K. Fujikawa, AIP Conf. Proc. 75, 340 (1981), or At. Data Nucl. Data Tables 27, 1 (1982); B. L. Henke, J. C. Davis, E. M. Gullikson, and R. C. C. Perera, A preliminary report on x-ray photoabsorption coefficients and atomic scattering factors for 92 elements in the 10-10000 eV region, Lawrence Berkeley Laboratory, University of California, Nov. 1988.
33. D. L. Windt, W. C. Cash, Jr., M. Scott, P. Arendt, B. Newnam, R. F. Fisher, and A. B. Swartzlander, Appl. Opt. 27, 246 (1988).
34. D. L. Windt, W. C. Cash, Jr., M. Scott, P. Arendt, B. Newnam, R. F. Fisher, A. B. Swartzlander, P. Z. Takacs, and J. M. Pinneo, Appl. Opt. 27, 279 (1988).
35. D. Mosher and S. J. Stephanakis, Appl. Phys. Lett. 29, 105 (1976).
36. I. C. Noyan and J. B. Cohen, Residual Stress (Springer, New York, 1987), Chap. 5, p. 122.
37. N. Yamamoto and S. Sakata, Jpn. J. Appl. Phys. 28, L2065 (1989).
38. J. B. Lasky, J. S. Nakos, O. J. Cain, and P. J. Geiss, IEEE Trans. Electron Devices ED-38, 262 (1991).
39. I. Sakai, H. Abiko, H. Kawaguchi, T. Hirayama, L. E. G. Johansson, and K. Okabe, 1992 Symposium VLSI Technical Digest Technical Papers 8A-1, 66 (1992).