Novel antireflective layer using polysilane for deep ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3398-3401

  Sato, Y ^a   Shiobara, E ^a   Miyoshi, S ^a   Asano, M ^a   Matsuyama, H ^a   Onishi, Y ^a   Nakano, Y ^a   Hayase, S ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0033261110     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591018     Document Type: Article

References (11)

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