Viability of conventional KrF imaging for 150 nm lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 6, 1997, Pages 2434-2438

  Azuma, T ^a   Matsunaga, K ^a   Kawamura, D ^a   Mimotogi, S ^a   Onishi, Y ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001625561     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589661     Document Type: Article

References (10)

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